Semiconductor Engineering

Process Variation Analysis Of Device Performance Using Virtual Fabrication — Methodology Demonstrated On A CMOS 14-nm FinFET Vehicle

A new methodology to assess the impact of fabrication inherent process variability on 14-nm fin field effect transistor (FinFET) device performance. August 18th, 2021 - By: Coventor A new methodology ...
Semiconductor Engineering

Model Variation And Its Impact On Cell Characterization

EDA (Electronic Design Automation) cell characterization tools have been used extensively to generate models for timing, power and noise at a rapidly growing number of process corners. Today, model ...